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SEMI G63-95 (Reapproved 0811)
SEMI M20-0998 (technical revision)
SEMI F104-0312 (technical revision)
SEMI M50 — Test Method for Determining Capture Rate and False Count Rate for Surface Scanning Inspection Systems by the Overlay Method
P04200 - SEMI P42 - Specification of Reticle Data for Automatic Recipe Transfer to Wafer Exposure System Revision:SEMI P42-0304 - Inactive SEMI G63-95 (Reapproved 0811)This specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www. semi. org February 2004; to be published March 2004. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not